Sputter magnetrons
Planar and cylindrical magnetron sputtering devices have been developed and put on sale.We produce both single and double magnetrons. The single magnetrons, installed by pairs and connected to an АС power supply, are used as the double magnetrons. We developed several types of the cylindrical rotary magnetrons, particularly: with a rotary target and rotary magnetic field, single or double configuration. As in case with the planar magnetrons, the single rotary magnetrons, installed by pairs and connected to an АС power supply, are used as the double rotary magnetrons. We deliver the magnetrons with power supplies and control systems, at Customer’s request they may be equipped with РЕМ and a gas admission system. Technological support may be rendered for process development and implementation.We may also assume supply of sputtering targets. Having created our own design criteria, we can also equip and modify existing vacuum deposition systems. |
Technical Specifications of single planar magnetrons Application: non-metal and metal webs, architectural glass, 3D parts in linear motion Configuration: cathode with magnetic system and dark-space shielding; external cooling water and power supply; compact or bonded targets Target width: 100…240 mm Target length: 500 … 3000 mm Target thickness: up to 24 mm Target utilization: up to 45% Power supply: DC (or AC for double magnetrons), up to 90 kW Target cooling: indirect or direct Technical Specifications of cylindrical rotary magnetrons Application: in-line glass and metal strip coating systems Configuration: rotary cathode tube with magnetic system and endblock; external drive, cooling water and power supply; compact target tube or backing tube with bonded, sprayed or cast sputtered material Target ID: 127 or 152 mm Target OD: 139 … 147 or 164 …172 mm Target length: up to 3000 mm Target utilization: up to 85% Power supply: DC, up to 100 kW, or AC for double rotary magnetrons up to 150 kW DC current: max 200 A Target cooling: direct |
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