Etching and cleaning of moving polymer, metal, glass and fabric substrates before coating to enhance adhesion characteristics.

Ion assistance during deposition to ensure stability of the coating properties.
The ion source operates according to the anode-layer-source principle.

The ion source produces the high current ion beam of variable energy between 200 and 1500 eV. Energetic ions physically etch the material surface, thus cleaning it.
On Customer’s request the ion source can be equipped with a power supply.

Glow Discharge sources

The glow discharge source consists of a compact box with two electrodes and integrated gas admission manifold for process gasses feeding and distribution in the pretreatment zone. The working gas flows are controllable.

A magnetic system is provided for higher effectiveness of the pretreatment.
Electric parameters of the glow discharge are automatically preset and sustained by the control system.
The sources are mainly used for treatment of moving plastic films.

Inverted magnetrons

The inverted magnetrons have been used successfully for treatment of moving metal foils.
The magnetron discharge is ignited on the substrate, which is practically a cathode, because it is moved along the roller cathode unit. The cathode unit magnetic system is fixed in the space. The cathode unit is equipped with an individual electrical drive.

Having created our own design criteria, we can also equip and modify existing vacuum deposition systems.