Vacuum deposition machines and processes for:
Webs
Non-metal webs
Metal webs
Glass
Glass pilot coater
In-line sputtering system
Powders
3D Parts
Vacuum machines and processes for:
Solar materials
Battery materials
Display materials
Components
Sputter magnetrons
Pretreatment devices
Evaporation devices
Sheet resistance measurement roller
Special equipment
Drying machines
Laminators
Contract coating






































Sidrabe, Inc.
Riga, Latvia LV-1073
Tel: +371 67249806
Fax: +371 67139506
E-mail: sidrabe@sidrabe.eu
Glass/In-line sputtering system

Vertical In-Line Sputtering Glass System 2SV2215MR operates in a single-pass mode and ensures one- and double-sided coating of flat glasses with various multi-layer stacks.
The In-Line System is typically used for the production of
  • anti-reflection and anti-static coatings
  • mirrors
  • transparent conductive coatings
  • low-E coatings

onto a wide range of glass substrates, transported in vertical cassettes.

The System is designed as a single-ended structure with lock, transfer and deposition chambers.
Different types of the cassettes and roller conveyers with optical detection of the cassettes position ensure transportation of different substrate formats. Linear ion beam sources are used for the glass both sides pretreatment.The deposition chamber is subdivided into similar sputter sections. Each sputter section is separated in two isolated compartments for direct and back travel of the cassettes for successive coating of both sides of the glasses.
The sputter sections are equipped with vertically positioned rotary magnetrons, providing particle-free glass coating.

Separate PEM channels for each pair of the magnetrons as well as in-situ measurement of coating optical parameters of each deposited layer are important features for optimum process control.
Each pair of the magnetrons has an individual gas supply system with up to 5 MFCs.
The sputter sections are pumped down symmetrically with turbo molecular pumps.
The control system provides a fully automated process.

Operation of the In-Line System is coordinated with a glass washing machine and a system of stations for glass loading/unloading on/off the cassettes and replacement of the cassettes.

Vertical In-Line Sputtering System Cassette input in the In-line Sputtering System Dual rotatable sputter magnetrons
Technical Specifications

Substrate

Material: glass
Dimensions: max 3000 mm x 4000 mm
Thickness: 4...15 mm
Coating: metals, oxides
Deposition modes: metallic and reactive
Sputter sections: up to 30
Power supplies for rotary magnetrons: AC
Ion beam sources: up to 10
Power supplies for ion sources: DC
Working speed of the cassettes: 1.5...2 m/min
In-line monitoring: optical reflection and transmission
Overall dimensions:
Length: up to 50 m
Width: 16.0 m
Height: 7.0 m
Total floor space required, including the loading/unloading stations:
Length: 73.0 m
Width: 20.0 m
Height: 8.0 m
Copyright 2001-2007 Sidrabe, Inc.
Designed by dfm